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00927nam a2200253 a 4500 |
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705182 |
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20171111231045.0 |
| 008 |
991011s1993 gr r 000 0 eng d |
| 020 |
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|a 0470220635
|q J. Wiley
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| 020 |
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|a 8122405614
|q Wiley Eastern
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| 040 |
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|a GR-KoDPT
|b gre
|e AACR2
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| 050 |
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|a TK7872.M3
|b P38 1993
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| 082 |
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0 |
|2 20
|a 621.3815/31
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| 100 |
1 |
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|a Tandon, U. S.,
|d 1952-
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| 245 |
1 |
0 |
|a Patterning of material layers in submicron region/
|c U.S. Tandon, W.S. Khokle
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| 260 |
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|a New York:
|b J. Wiley,
|c 1993
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| 300 |
|
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|a xii, 183 σ. :
|b εικ. (μερ. έγχρ.) ;
|c 25 εκ.
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| 504 |
|
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|a Περιέχει βιβλιογραφικές παραπομπές και ευρετήριο
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| 650 |
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0 |
|a Integrated circuits
|x Masks
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| 650 |
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0 |
|a Ion beam lithography
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| 650 |
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0 |
|a Lithography, Electron beam
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| 700 |
1 |
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|a Khokle, W. S.
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| 710 |
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|a Wiley
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| 952 |
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|a GR-KoDPT
|b 59cc211d6c5ad13446f89c3c
|c 998a
|d 945l
|e TK 7872
|t 1
|x m
|z Books
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